Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Ronald Troutman
Synthetic Metals
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
J.K. Gimzewski, T.A. Jung, et al.
Surface Science