Pong-Fei Lu, Leon Sigal, et al.
IEEE International SOI Conference 2004
This paper describes a device profile design concept that reduces the junction field, and thus the high-field-induced leakage currents as well as the avalanche current. The insertion of an i-layer of thickness equal to the depletion-layer width of the original n + -p+ junction can lower the junction field by about a factor of 2. Computer studies show that using this design, the collector avalanche current can be reduced by more than one order, while compromising little in the switching speed of the transistor. © 1989 IEEE
Pong-Fei Lu, Leon Sigal, et al.
IEEE International SOI Conference 2004
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