R. Srinivasan, Bodil Braren, et al.
Journal of Applied Physics
The effect of pulse width on the ablation of polymers has been extended to ultrashort pulses (160 fs) of 308 nm wavelength. Polymethylmethacrylate has negligible absorption at this wavelength for one-photon excitation. With the ultrashort pulse clean etching without any sign of thermal damage can be achieved at fluences as little as 0.2-0.3 J/cm2. This is the first demonstration that the high power of ultrashort pulses of ultraviolet light can produce photochemical etching by taking advantage of multiphoton excitation to dissociative states.
R. Srinivasan, Bodil Braren, et al.
Journal of Applied Physics
Heinz-Peter Schuchmann, Clemens Von Sonntag, et al.
Journal of Photochemistry and Photobiology, A: Chemistry
R. Srinivasan, Kelly G. Casey, et al.
Journal of Applied Physics
R. Srinivasan, Jose A. Ors, et al.
Journal of Organic Chemistry