Julien Autebert, Aditya Kashyap, et al.
Langmuir
We have investigated the adsorption and reaction of PH3 on Si(111)-(7×7) between 100 and 900 K. The topology, electronic structure, and chemical reactivity of the resulting P-doped surface was studied by ultraviolet photoemission spectroscopy, low-energy electron diffraction, and ion-scattering spectroscopy. The P-doped surface has a P(111)-(1×1) structure where P substitutes for the first Si-layer atoms of the Si(111) surface. This surface has no dangling bonds and is chemically inert. © 1991 The American Physical Society.
Julien Autebert, Aditya Kashyap, et al.
Langmuir
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
T. Schneider, E. Stoll
Physical Review B