British Journal of Applied Physics

Paper

20 Nov 2002

Annealing of residual stress in silicon monoxide films [1]

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Abstract

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Paper

Role of the intermetallic compounds in determining the superconducting transition temperature of superimposed metal films

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Physics Letters

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Characteristics of the annealing kinetics of tin films deposited at 88°K

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Stripping effects in the reactions C12(He3, p)N14 and C12(He3, d)N13 at 13.9 Mev

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Low-temperature properties of evaporated lead films

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