Y.Y. Li, K.S. Leung, et al.
J Combin Optim
No abstract available.
Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering