The DX centre
T.N. Morgan
Semiconductor Science and Technology
Bias-dependent scanning tunneling microscopy (STM), used in conjunction with atomic-charge superposition calculations, is shown to provide information on both atomic and electronic surface structure. Si(111)-(7×7) STM images measured with different bias voltages are compared with a number of recent structural models. Striking agreement is found with the stacking-fault-adatom model of Takayanagi. The unit-cell asymmetry found at negative sample bias is attributed to a stacking fault in one half of the unit cell, locally modifying the surface electronic structure. © 1986 The American Physical Society.
T.N. Morgan
Semiconductor Science and Technology
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications