Paper
The DX centre
T.N. Morgan
Semiconductor Science and Technology
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
T.N. Morgan
Semiconductor Science and Technology
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
David B. Mitzi
Journal of Materials Chemistry
R. Ghez, M.B. Small
JES