Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We present a Branch-and-Cut algorithm where the volume algorithm is applied instead of the traditionally used dual simplex algorithm to the linear programming relaxations in the root node of the search tree. This means that we use fast approximate solutions to these linear programs instead of exact but slower solutions. We present computational results with the Steiner tree and Max-Cut problems. We show evidence that one can solve these problems much faster with the volume algorithm based Branch-and-Cut code than with a dual simplex based one. We discuss when the volume based approach might be more efficient than the simplex based approach. © EDP Sciences 2006.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
György E. Révész
Theoretical Computer Science
Thomas R. Puzak, A. Hartstein, et al.
CF 2007
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering