Italo Buleje, Vince Siu, et al.
ICDH 2023
The minimum yield of axial channeling and its half angular width in <100>, <110> and <111> cut Si wafers were investigated by the simultaneous observation of ion induced X-rays and backscattered ions. Helium ions at 0.25, 0.5, 1 and 2 MeV were used to cover a range of velocities and impact parameters in order to study the K and L shell X-ray production. Both minimum yield and half angle for Si K X-ray production are very similar to those for backscattering. The minimum yield for the Si L X-ray is considerably higher and the half angle is considerably narrower than those of backscattered ions. © 1978.
Italo Buleje, Vince Siu, et al.
ICDH 2023
Joshua Hui, Sarah Knoop, et al.
IHI 2012
Alice Driessen, Susane Unger, et al.
ISMB 2023
Julien Cors, Aditya Kashyap, et al.
PLoS ONE