Jeehwan Kim, Stephen W. Bedell, et al.
ECS Transactions
A compact waveguide-integrated Germanium-on-insulator (GOI) photodetector with 10 ± 2fF capacitance and operating at 40Gbps is demonstrated. Monolithic integration of thin single-crystalline Ge into frontend CMOS stack was achieved by rapid melt growth during source-drain implant activation anneal. ©2010 Optical Society of America.
Jeehwan Kim, Stephen W. Bedell, et al.
ECS Transactions
Ning Li, Kevin Han, et al.
Advanced Materials
Faraz Najafi, Jacob Mower, et al.
CLEO 2014
Solomon Assefa, Fengnian Xia, et al.
OFC 2009