Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
This article reviews recent advances in convex optimization algorithms for big data, which aim to reduce the computational, storage, and communications bottlenecks. We provide an overview of this emerging field, describe contemporary approximation techniques such as first-order methods and randomization for scalability, and survey the important role of parallel and distributed computation. The new big data algorithms are based on surprisingly simple principles and attain staggering accelerations even on classical problems. © 2014 IEEE.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Proceedings of SPIE - The International Society for Optical Engineering
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CCS 2024
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