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American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Paper
01 Sep 1997
Cross-linking of poly{1,1-diaryl(alkyl,aryl) 1-silacyclobutanes} under electron beam and deep UV irradiation
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An MOS transistor with Schottky source/drain contacts and a self-aligned low-resistance T-gate
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Silylation of (photo)resist materials using polyfunctional organosilicon compounds
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