Hiroshi Ito, Reinhold Schwalm
JES
Photochemical deposition from Cr(CO)6, Mo(CO)6, and W(CO)6 is described for processes induced by a CW frequency-doubled argon ion laser (257 nm) and a pulsed KrF* excimer laser (248 mm). Kinetic data on the deposition process induced by the frequency-doubled argon ion laser indicate that deposition is initiated by single-photon dissociation of the hexacarbonyl in the gas phase. A more qualitative study of projection deposition from W(CO)6 induced by the KrF* laser indicates that gas-phase photodissociation of the hexacarbonyl is also important in the pulsed laser deposition process. © 1989.
Hiroshi Ito, Reinhold Schwalm
JES
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters