Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
Paper
Distortion of masks for x-ray lithography
Abstract
Experimental and theoretical results are presented on the determination of distortion induced during the process of fabrication of X-ray lithography masks. The studies were performed on B-doped Si and on B-N-H mask substrates. © 1985.
Related
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials