Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Distributed deadlock models are presented for resource and communication deadlocks. Simple distributed algorithms for detection of these deadlocks are given. We show that all true deadlocks are detected and that no false deadlocks are reported. In our algorithms, no process maintains global information; all messages have an identical short length. The algorithms can be applied in distributed database and other message communication systems. © 1983, ACM. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Raghu Krishnapuram, Krishna Kummamuru
IFSA 2003
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Robert E. Donovan
INTERSPEECH - Eurospeech 2001