Lawrence Suchow, Norman R. Stemple
JES
The Helios compact synchrotron installed at IBM's Advanced Lithography Facility provides a unique opportunity to obtain compact synchrotron reliability data in an industrial environment. This paper presents data from the first eight months of user oriented operation of the machine. Running and uptime statistics are tabulated, as well as achieved performance parameters. Unscheduled downtime in the various subsystems is described. © 1993.
Lawrence Suchow, Norman R. Stemple
JES
Michiel Sprik
Journal of Physics Condensed Matter
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials