Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry
The Helios compact synchrotron installed at IBM's Advanced Lithography Facility provides a unique opportunity to obtain compact synchrotron reliability data in an industrial environment. This paper presents data from the first eight months of user oriented operation of the machine. Running and uptime statistics are tabulated, as well as achieved performance parameters. Unscheduled downtime in the various subsystems is described. © 1993.
Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Mark W. Dowley
Solid State Communications