Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We consider a model of non-interacting two-way traffic for the design of a sequence of two consecutive traffic lights. In order to calculate the optimal offset we maximize the probability of traversing the system without stopping and assume a given travel time distribution. The results are compared to the current engineering design. © 1966.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Leo Liberti, James Ostrowski
Journal of Global Optimization