Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Analysis of recently published measurements of the specific heat of heavily doped n-type silicon reveals a dependence of the Debye temperature on doping. © 1978.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B