R. Haight, J.A. Silberman
Applied Surface Science
Using angle-resolved picosecond laser photoemission we have investigated both occupied and transiently excited empty states at the surface of Ge grown epitaxially on GaAs(110). We observe a normally unoccupied, Ge layer derived state whose separation from the valence-band maximum of the system is 700±50 meV at six monolayers Ge coverage. The evolution of the electronic structure is followed as a function of coverage and correlated with low-energy electron diffraction. The time dependence of the transiently occupied Ge signal is compared with that of the clean GaAs(110) surface and shows that electrons are <me;40p>prevented from diffusing into the GaAs bulk by the conduction-band offset of 330±40 meV.
R. Haight, J.A. Silberman
Applied Surface Science
D.R. Peale, R. Haight, et al.
Thin Solid Films
B. Langa, D. Sapkota, et al.
AIP Advances
B. Cartier, M. Steen, et al.
VLSI Technology 2009