Conference paperAn analysis of the effects of miss clustering on the cost of a cache missThomas R. Puzak, A. Hartstein, et al.CF 2007
Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Conference paperHealthSense: Classification of health-related sensor data through user-assisted machine learningErich P. Stuntebeck, John S. Davis II, et al.HotMobile 2008
