Conference paper
Fabrication of phase shifting masks employing multi-layer films
T.C. Chicu, K.K. Shih, et al.
Microlithography 1994
A method of fabricating of Fe/Fe-N multilayer films in the form of alternating thin films of Fe separated by very thin interlayers of Fe-N sputtered in the presence of nitrogen is described. It was found that the properties of these films depended on the thickness of Fe and Fe-N layers and the bias voltage. There is a region where the composite films have coercivity less than 1 Oe, with zero or near-zero magnetostriction. The normally high saturation magnetization of Fe with value of 20 kG was preserved.
T.C. Chicu, K.K. Shih, et al.
Microlithography 1994
D.B. Dove, T. Takamori, et al.
Journal of Luminescence
T. Takamori, K.K. Shih, et al.
Journal of Applied Physics
T.C. Chicu, K.K. Shih, et al.
Microlithography 1994