Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
Hydrogen-related defects and oxygen vacancies in silica are analyzed using first-principles density-functional calculations. Energetics, structures, charge-state levels, and hyperfine parameters are determined. These calculations identify the hydrogen bridge related to the E41 center as the defect responsible for the stress-induced leakage current, a forerunner of dielectric breakdown of gate oxides in transistors.
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
J.A. Barker, D. Henderson, et al.
Molecular Physics