Joseph M. Jasinski, Stephen M. Gates
Accounts of Chemical Research
Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.
Joseph M. Jasinski, Stephen M. Gates
Accounts of Chemical Research
Bernard S. Meyerson, Joseph M. Jasinski
Journal of Applied Physics
Joseph M. Jasinski, Joan K. Frisoli, et al.
The Journal of Chemical Physics
Joseph M. Jasinski
Journal of Physical Chemistry