Conference paperTotal Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solutionMoutaz Fakhry, Yuri Granik, et al.SPIE Photomask Technology + EUV Lithography 2011
PaperAutomated search method for AFM and profilersMichael Ray, Yves C. MartinProceedings of SPIE - The International Society for Optical Engineering
PaperMulti-dimensional Filter Banks and Wavelets - A System Theoretic PerspectiveSankar BasuJournal of the Franklin Institute
