Conference paper
Digital noise-tolerant silicon nanophotonic switch
Joris Van Campenhout, William M. J. Green, et al.
CLEO 2010
To enable in-line nanophotonic device monitoring, grating couplers for near-vertical wafer-scale optical probing are fabricated in a standard CMOS process. These partially etched "optical probes" demonstrate a robust 3-dB-bandwidth larger than 80 nm allowing for photonic device characterization over the entire C-band throughout the fabrication process. © 2011 IEEE.
Joris Van Campenhout, William M. J. Green, et al.
CLEO 2010
Jeffrey B. Driscoll, William Astar, et al.
IEEE Journal on Selected Topics in Quantum Electronics
Benjamin G. Lee, Solomon Assefa, et al.
CLEO-SI 2011
William M. J. Green, Solomon Assefa, et al.
LEOS 2008