Robert W. Keyes
Journal of Applied Physics
Suitably strained silicon exhibits a mobility anisotropy that can be used to advantage in field-effect transistors. The desired strain can be achieved through heteroepitaxy. Copyright © 1986 by The Institute of Electrical and Electronics Engineers, Inc.
Robert W. Keyes
Journal of Applied Physics
Robert W. Keyes
Proceedings of the IEEE
Robert W. Keyes
Reports on Progress in Physics
Robert W. Keyes
Science