Pradip Bose, Augusto Vega, et al.
HPCA 2025
High-NA EUV exposure tool implications: The anamorphic nature of the high NA EUV (4x magnification in X and 8x magnification in Y) results in a field size exactly half that on current EUV and optical tools. When using high-NA tools in a semiconductor build that will also use full field tools, there are overlay implications and chip and mask layout issues that need to be optimized.
Pradip Bose, Augusto Vega, et al.
HPCA 2025
Pavlos Maniotis, Laurent Schares, et al.
J. of Opt. Comm. and Netw.
Minxuan Zhou, Yujin Nam, et al.
DAC 2024
Pavlos Maniotis, Laurent Schares, et al.
SPIE OPTO 2021