J.H. Stathis, J. Chapple-Sokol, et al.
Applied Physics Letters
The fabrication and electrical characteristics of MOSFET’s incorporating thin gate oxides deposited by a modified plasma-enhanced chemical-vapor-deposition (PECVD) process are reported. The gate oxide deposition and all subsequent steps were carried out at or below 400°C. These results represent the first demonstration of near thermal gate oxide quality MOSFET’s fabricated using a low-temperature PECVD gate oxide process without requiring a high-temperature anneal. The ultimate performance of the deposited oxide devices is shown to be critically dependent on the degree of process induced microroughness of the starting silicon surface. Low-temperature effective mobility measurements are used to compare inversion-layer scattering mechanisms in these devices. © 1989 IEEE
J.H. Stathis, J. Chapple-Sokol, et al.
Applied Physics Letters
M.B. Ketchen, B.J. van der Hoeven, et al.
IEEE Electron Device Letters
J. Batey, S.L. Wright
Journal of Applied Physics
J. Batey, E. Tierney, et al.
Applied Surface Science