High-speed optical receivers in advanced silicon technologies
J. Schaub, S.M. Csutak, et al.
LEOS 2002
In this paper, we propose a junction-substrate LTD structure. Two-dimensional device simulations indicate that the built-in electric field created by the buried junction can effectively block the deep carriers and increase the bandwidth. The buried p-n junction can be realized by conventional techniques such as epitaxy. Preliminary experimental results show significant enhancement in bandwidths in such devices. Further device simulations show that a 50 μm diameter device can achieve a transit time limited bandwidth in excess of 10GHz with an optimized design.
J. Schaub, S.M. Csutak, et al.
LEOS 2002
J.A. Kash, C.W. Baks, et al.
LEOS 2003
Marwan H. Khater, Zhen Zhang, et al.
IEEE Electron Device Letters
Qiqing Ouyang, Min Yang, et al.
VLSI Technology 2005