E. Burstein
Ferroelectrics
We have developed an electron lithography method, Hot Electron Emission Lithography (HEEL), which is capable of printing integrated circuits with an exposure time of only a few seconds. The basic design of the mask, manufactured by standard MOS technology, will be discussed. Patterns printed into e-beam resist by a 1:1 projection system show the applicability of the mask for lithography purposes. The minimum feature size projected so far is 160 nm in a system capable of 90 nm resolution. Further improvements in resolution to 50 nm are possible.
E. Burstein
Ferroelectrics
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials