Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A new polymer multilayer fabrication method by the use of thin films of lamellar polystyrene-block-poly(methyl methacrylate was investigated. The thin-film striped patterns of parallel and perpendicular polystyrene-block- poly(methyl methacrylate) (PS-b-PMMA) lamellar to compare the time evolution of ε were prepared. The thin films of cylindrical and lamellar materials were spin casted and annealed for a time range of 5-4000 minutes. The perpendicular orientation of the lamellar domains were surface pretreated with a random copolymer brush prior to diblock copolymer applications. The measurements show that the topological differences between the cylindrical and lamellar morphologies influence coarsening kinetics.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
Ellen J. Yoffa, David Adler
Physical Review B
Imran Nasim, Melanie Weber
SCML 2024