Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Hot electrons in GaAs in the presence of a highly nonequilibrium plasma generated by a 150-fs laser pulse are shown to have an energy-loss rate to the plasma that is two to four times higher than a hot electron in the presence of a cooler, thermalized plasma of the same density. The increased energy-loss rate due to the nonequilibrium plasma is consistent with the reduced screening that has been predicted for such a plasma. In addition, the linewidth of the hot acceptor luminescence peak, which is used to measure the energy-loss rate, is found to be constant under fs laser excitation as the injected carrier density is increased up to about 2×1016 cm-3. This finding disagrees with a recent prediction. Possible reasons for the disagreement are considered. © 1995 The American Physical Society.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
R. Ghez, J.S. Lew
Journal of Crystal Growth