M. Hargrove, S.W. Crowder, et al.
IEDM 1998
Rapid thermal annealing has been used for fabrication of YBaCuO thin films from Cu/BaO/Y2O3 layered structures. The films were deposited on Si substrates by electron-beam evaporation. The interdiffusion at the film/substrate interface has been investigated using Auger depth profiling. With a metal barrier layer, the film showed the superconducting transition between 74-85 K. At anneal temperature above 980°C, Si was found to diffuse throughout the film and degrade the superconductivity of the films. © 1989.
M. Hargrove, S.W. Crowder, et al.
IEDM 1998
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
T.N. Morgan
Semiconductor Science and Technology
J.A. Barker, D. Henderson, et al.
Molecular Physics