Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Low-energy electron microscopy (LEEM) is a relatively new microscopy technique, capable of high-resolutiOn (5 nm) video-rate imaging of surfaces and interfaces. This opens up the possibility of studying dynamic processes at surfaces, such as thin-film growth, strain relief, etching and adsorption, and phase transitions in real time, in situ, as they occur. The resulting video movies contain an unprecedented amount of information that is amenable to detailed, quantitative analysis. In this paper we discuss the principles of LEEM and its application to problems in science and technology.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
B. Wagle
EJOR
Indranil R. Bardhan, Sugato Bagchi, et al.
JMIS
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989