Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The low-temperature negative domain wall (DW) contribution to the resistivity observed in expitaxial Fe microstructures has been investigated as a function of film thickness. The DW spin structure changes from Bloch to Neel-like with decreasing film thickness. Results suggest that an interplay between orbital effects in the internal magnetic fields near DWs and thin film surface scattering are at the origin of the observed negative wall contribution.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
T.N. Morgan
Semiconductor Science and Technology
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020