Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We identify a set of generators for the automorphism group of the one-sided d-shift. For the 3-shift, this set of generators has an application to the dynamics of cubic polynomials. © 1990, Cambridge University Press. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Heng Cao, Haifeng Xi, et al.
WSC 2003
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Andrew Skumanich
SPIE Optics Quebec 1993