Conference paperReactive diffusion in the Ni-Si system: Influence of Ni thickness on the phase formation sequenceC. Coïa, C. Lavoie, et al.ECS Meeting 2005
PaperThermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin filmsC. Detavernier, C. Lavoie, et al.Journal of Applied Physics
PaperOxidation of silicon-germanium alloys. II. A mathematical modelP.-E. Hellberg, S.-L. Zhang, et al.Journal of Applied Physics
PaperPolytype formation in zirconium-silicon thin filmsA. Bourret, F.M. D'Heurle, et al.Journal of Applied Physics
