Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
The phenomenon of metastable phase formation during a constant temperature and constant pressure thin film reaction is explained by a kinetic model emphasizing the rate of transition. It is assumed that the reaction obeys a maximum time-dependent rather than time-independent negative free energy change. The product persists in the metastable state due to a high activation barrier to later transition. © 1991.
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Mark W. Dowley
Solid State Communications
T.N. Morgan
Semiconductor Science and Technology