L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
The effect of N content on the structure and properties of rf relatively sputtered α-SiNx was investigated. The N content in the α-SiNx film increases with the N2 flow rate until the stoichiometric composition (Si3N4) is reached. The refractive index asymptotically reaches 1.99 as the N/Si ratio approaches 1.33. The maximum density of 3.2 g/cm3 and hardness of 25 GPa are attained at the stoichiometric composition.
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Frank Stem
C R C Critical Reviews in Solid State Sciences
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures