R.A. Budd, D.B. Dove, et al.
Microlithography 1994
An ion gun has been modified to operate in a continuously pumped mode, in which gas is leaked directly into the ionization region, and the vacuum system is pumped to ∼10-7 Torr Ar by a helium cryopump. A milling rate of 3.8 Å/sec was obtained for SiO2 using 2 keV Ar ions. Sample to gun distance was 5 cm. This may be compared with the rate 0.8 Å/sec, obtained when operating in a static vacuum of 5×10-5 Torr Ar.
R.A. Budd, D.B. Dove, et al.
Microlithography 1994
M.R. Wordeman, A.M. Schweighart, et al.
VLSI Technology 1983
K.K. Shih, D.B. Dove
Applied Physics Letters
D.B. Dove, R. Ludeke, et al.
Journal of Applied Physics