D. Kern, P. Coane, et al.
Proceedings of SPIE 1989
An ion gun has been modified to operate in a continuously pumped mode, in which gas is leaked directly into the ionization region, and the vacuum system is pumped to ∼10-7 Torr Ar by a helium cryopump. A milling rate of 3.8 Å/sec was obtained for SiO2 using 2 keV Ar ions. Sample to gun distance was 5 cm. This may be compared with the rate 0.8 Å/sec, obtained when operating in a static vacuum of 5×10-5 Torr Ar.
D. Kern, P. Coane, et al.
Proceedings of SPIE 1989
A.P. Ghosh, D.B. Dove, et al.
Microlithography 1992
Juan Agui, P.N. Sanda, et al.
Electronic Imaging: Advanced Devices and Systems 1990
D.B. Dove, G. Diniz, et al.
Journal of imaging science