A.R. Conn, I.M. Elfadel, et al.
DAC 1999
An ion gun has been modified to operate in a continuously pumped mode, in which gas is leaked directly into the ionization region, and the vacuum system is pumped to ∼10-7 Torr Ar by a helium cryopump. A milling rate of 3.8 Å/sec was obtained for SiO2 using 2 keV Ar ions. Sample to gun distance was 5 cm. This may be compared with the rate 0.8 Å/sec, obtained when operating in a static vacuum of 5×10-5 Torr Ar.
A.R. Conn, I.M. Elfadel, et al.
DAC 1999
R.A. Budd, D.B. Dove, et al.
Microlithography 1994
Ph. Avouris, I.F. Chang, et al.
Journal of Electronic Materials
K.K. Shih, M.E. Re, et al.
Applied Physics Letters