Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A practical multiport measurement method is presented for the precise characterization of an N-port device using a two-port vector network analyzer. Because the N - 2 unused ports need not be terminated with matched loads, a test fixture can be simplified. Any influence of the reflections from the unterminated ports can be deembedded by port renormalization. The proposed method was verified with a coupled microstrip line structure. © 2007 IEEE.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Gangulee, F.M. D'Heurle
Thin Solid Films
Imran Nasim, Melanie Weber
SCML 2024
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials