J.A. Van Vechten
Physica B+C
In the accompanying paper we have given evidence that pulsed laser annealing of Si does not involve normal thermal melting and recrystallization. Here we argue the importance of the electron-hole plasma produced by the laser to the annealing process. © 1979.
J.A. Van Vechten
Physica B+C
L.L. Chang, L. Esaki, et al.
Applied Physics Letters
R. Tsu, F.C. Whitmore
Physics Letters A
J.M. Gibson, R. Tsu
Applied Physics Letters