J.A. Van Vechten
Physical Review B
In the accompanying paper we have given evidence that pulsed laser annealing of Si does not involve normal thermal melting and recrystallization. Here we argue the importance of the electron-hole plasma produced by the laser to the annealing process. © 1979.
J.A. Van Vechten
Physical Review B
R. Tsu
Journal of Applied Physics
R. Tsu, L.L. Chang, et al.
Physical Review Letters
J.A. Van Vechten, J.F. Wager
Journal of Applied Physics