Conference paperLithographic characteristics of 193-nm resists imaged at 193 and 248 nmJuliann Opitz, Robert D. Allen, et al.Microlithography 1998
Conference paperIT service management automation - A hybrid methodology to integrate and orchestrate collaborative human centric and automation centric workflowsNaga Ayachitula, Melissa Buco, et al.SCC 2007
PaperAdaptive solution strategy for solving large systems of p‐type finite element equationsR.B. Morris, Y. Tsuji, et al.International Journal for Numerical Methods in Engineering
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
