Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
We prove that in an undirected graph there are at most O(n2) cuts of size strictly less than 3/2 of the size of the minimum cut.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998
Thomas M. Cover
IEEE Trans. Inf. Theory
B. Wagle
EJOR