Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We consider the power of several programming features such as counters, pushdown stacks, queues, arrays, recursion and equality. In this study program schemas are used as the model for computation. The relations between the powers of these features is completely described by a comparison diagram. © 1975.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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