Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Paper
On Walsh equiconvergence
Related
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989
Fernando Martinez, Juntao Chen, et al.
AAAI 2025
Conference paper
Convergence properties of multi-dimensional stack filters
Peter Wendt
Electronic Imaging: Advanced Devices and Systems 1990