Alberto Nardi, Johann Riemensberger, et al.
NP 2022
A detailed procedure is presented for fabrication of free-standing silicon photonic devices that accurately reproduces design dimensions while minimizing surface roughness. By reducing charging effects during inductively coupled-plasma reactive ion etching, undercutting in small, high-aspect ratio openings is reduced. Slot structures with a width as small as 40 nm and an aspect ratio of 5.5:1 can be produced with a nearly straight, vertical sidewall profile. Subsequent removal of an underlying sacrificial silicon dioxide layer by wet-etching to create free-standing devices is performed under conditions which suppress attack of the silicon. Slotted one-dimensional photonic crystal cavities are used as sensitive test structures to demonstrate that performance specifications can be reached without iteratively adapting design dimensions; optical resonance frequencies are within 1% of the simulated values and quality factors on the order of 105 are routinely attained.
Alberto Nardi, Johann Riemensberger, et al.
NP 2022
Alberto Nardi, Alisa Davydova, et al.
Optica
Mikhail Churaev, Annina Riedhauser, et al.
CLEO_SI 2021
Dalziel J. Wilson, Simon Hönl, et al.
CLEO 2018