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Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Leo Liberti, James Ostrowski
Journal of Global Optimization
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Khalid Abdulla, Andrew Wirth, et al.
ICIAfS 2014