J.H. Stathis, R. Bolam, et al.
INFOS 2005
Thermal fluctuations of phase boundaries seperating two regions of Si surfaces near the phase transition temperature of 1135 K were analyzed by low-energy electron microscopy. The surface stress difference between the phases was found to affect the surface morphology and was estimated to be 0.06ev/(angstrom)2. The effect of elastic self-interactions at the phase boundary was integrated at the local phase boundary stiffness.
J.H. Stathis, R. Bolam, et al.
INFOS 2005
T.N. Morgan
Semiconductor Science and Technology
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
K.A. Chao
Physical Review B