Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
Thermal fluctuations of phase boundaries seperating two regions of Si surfaces near the phase transition temperature of 1135 K were analyzed by low-energy electron microscopy. The surface stress difference between the phases was found to affect the surface morphology and was estimated to be 0.06ev/(angstrom)2. The effect of elastic self-interactions at the phase boundary was integrated at the local phase boundary stiffness.
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
T.N. Morgan
Semiconductor Science and Technology
Peter J. Price
Surface Science
Mark W. Dowley
Solid State Communications